Spectra of Different IR Sources
Modern semiconductor processing tools are among the most precisely controlled physical/chemical environments in the world. At the same time these tools are also among the most complex industrial equipment in history. To ensure all devices being built are processed under identical conditions so that any reaction, growth and migration of the different substances can occur consistently and reliably, WITINC offers products that can detect minute variation in process conditions, most notabily, temperature and film thickness.
Nanometer Thickness Resolution 
TEEMAP offers Fab users and OEMs a wide range of temperature monitoring capabilities based on specially-designed IR sensors. From room temperature lithography to 1,000+ ºC thermal annealing process, TEEMAP can offer single-point or two-dimensional temperature data for process control, tool-match and trouble-shooting purposes.
RedEye is capable of sub-nanometer film thickness resolution for most metal films, including barrier/seed stacks found in advanced metal gates.
Integrated Metrology (IM) is the on-tool sensor deployment scheme that can provide real-time R2R information on either the process tools or the production wafers. Both RedEye and TEEMAP are IM-Ready
Live Run2Run Wafer Temperature Data